Projection Simulation Example


Projection lithography is widely used for technological development; however, it presents several physical and chemical challenges. Firstly, it is limited by diffraction, and secondly the response of the photoresists varies depending on factors as the substrate material and the development process. Therefore, the simulation of an exposure increases the chances of a successful fabrication. Pre-exposure simulation is critical to improve time and cost efficiency.


LAB offers a simple platform for projection lithography simulation. Changing different parameters allows the simulation of hundreds of different conditions in relatively short periods. Moreover, complete simulation helps to track exposure problems and to provide solutions efficiently.