Projection Simulation Quick Guide

Motivation:

Projection lithography is driving its limit in size and technology. Pre-exposure simulation is critical to improve time and cost efficiency.

Solution:

LAB is offering the desired simulation platform for projection lithography. It offers simulation from light source to 3D resist profile formation. The intensity image and resist profile are simulated. Changing different parameters allows the simulation of hundreds of different conditions in relatively short periods. Moreover, complete simulation helps to track exposure problems and to provide solutions efficiently.