Pattern replacement and filtering for post processing

Motivation:

The layouts for chips are drawn using complex polygons which are attained by many small simple geometries. To attain a desired application, sections of the layout require to be changed to get the optimal design. Accordingly, the simulation and optimisation of an entire layout is complicated and time consuming.

Solution:

BEAMER incorporates the filter and replace modules. The Filter module allows selecting critical shapes or regions while the Replace module, on the other hand, gives the alternative to substitute a filtered region by other shapes or entire layout layers. Both modules facilitate the layout modification and optimisation.