Nano-Micro-Lithography Symposium November 2021

Following the great success of the last two Nano-Micro-Lithography Symposia, the fall edition of our joint event will again take the form of a virtual event. This online event brings together technical experts, customers and users from GenISys GmbH, Nanoscribe, micro resist technology GmbH, Heidelberg Instruments and Raith, discover the latest technologies and products for Nano-Micro-Lithography. Several system users from the participating companies will provide detailed insights into their micro-fabrication projects and describe experiences with various products and technologies. In addition, there will be an inspiring student project pitch and numerous networking opportunities to discuss your projects. Also new is a dedicated job fair with information on current job openings and the opportunity to talk specifically about jobs and careers with representatives from participating companies.

So please save the date in your calender --

      Date: November 4th, 2021, starting at 8.30 am CET
      Place: Online on - the event link will be provided closer to the event date


To register for Nano-Micro-Lithography Symposium, please click HERE (Please scroll down the page until after the agenda)

Preliminary Agenda

8:00 CET Access to
8:30 CET Welcome & organizational hints
8:40 CET Session 1
8:40 e-Beam and Laser Lithography Simulation – pushing the limits of nanofabrication
Thomas Michels, GenISys
9:05 Fabrication of photonic and optomechanical circuits with BEAMER and RAITH VOYAGER EBL
Erik Holmgren, AlbaNova Nanolab, KTH
9:30 Rapid prototyping and production of 3D mechanical microparts
Dr. Benjamin Richter, Nanoscribe
9:55 Two-Photon 3D-printed structure on capillary tip for micromanipulation and fluid manipulation
Antoine Barbot, femto-st
10:20 Matching lithography processes to implement hierarchical nano-micro-pattern
Johannes Wolf, micro resist technology
10:45 Challenges for integration of optical elements
Dr. Danny Reuter, Zentrum für Mikrotechnologien, TU Chemnitz
11:10 CET Networking
Visiting booths & exchange of thoughts
12:00 CET Lunch break
13:00 CET Students project pitch
15 undergraduate and graduate students present inspiring topics. Each speaking very concisely about project idea, microfabrication task, and key innovation.
14:00 CET Session 2
14:00 Maskless grayscale lithography
Dominique Collé, Heidelberg Instruments Mikrotechnik
14:25 Cleanroom in a Glovebox
Professor Kenneth Burch, Boston College
14:50 The new EBPG Plus: E-Beam Lithography applications with a Plus in Throughput and Precision
Frank Nouvertné, Raith GmbH Germany
15:15 Large area x-ray gratings for space, meta lenses and Quantum devices on 2D materials – a wide range of cutting edge applications for EBL at Penn State
Chad Eichfeld, Penn State University
15:25 to 15:30 CET Concluding remarks and farewell
15:30 to 16:00 CET Networking & visiting booths
16:00 CET Event finds to its end

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