BEAMeeting Stuttgart 2024
The GenISys BEAMeeting Stuttgart 2024 was held very successfully on Wednesday, 10th and 11th of April, 2024 at IMS CHIPS in Stuttgart, Germany for both on-site and on-line attendees. The meeting was well-attended, creating an excellent atmosphere for knowledge exchange.
Our General Manager Uli Hofmann, Vice President Nezih Ünal, along with a group of product managers, regional managers, and application engineers, were present to give a full overview of company business and addressed various points raised during the meeting. The BEAMeeting featured outstanding presentations from both customers and the GenISys applications team, which led to engaging technical discussions and valuable feedback.
As a highlight, attendees enjoyed exciting tours at the IMS Chips clean room facilities and the MPI for Solid State Research including the impressive Precision Lab.
Many thanks to all who have contributed, especially for the great user presentations!
Special thanks to IMS CHIPS for hosting our BEAMeeting and for their invaluable support and collaboration. Your efforts are greatly appreciated!
The following are the BEAMeeting presentations and recorded videos.
BEAMeeting Presentations
Application Use Cases ProSEM
Automated Layout-based SEM Metrology with ProSEM and InSPEC
BEAMER Update
GenISys Intro
Grayscale Lithography in HSQ and the application of dose gradient shapes
Introduction IMS Chips
Loops Variables Functions
Nanostructuring Lab at the MPI for Solid State Research
Optimizing chemically amplified photoresist processes in ebeam_lithography
Proximity effect correction for e-Beam fabrication of Aluminum Oxide waveguides
Resolution optimization optical lithography
Towards automation and parallelization in thermal scanning probe lithography with the NanoFrazor
BEAMeeting Videos
Application Use Cases ProSEM
Automated Layout-based SEM Metrology with ProSEM and InSPEC
BEAMER Update
GenISys Intro
Grayscale Lithography in HSQ and the application of dose gradient shapes
Introduction IMS Chips
Loops Variables Functions
Optimizing chemically amplified photoresist processes in ebeam_lithography
Proximity effect correction for e-Beam fabrication of Aluminum Oxide waveguides
Resolution optimization optical lithography
Towards automation and parallelization in thermal scanning probe lithography with the NanoFrazor